Dr. Althea 345 Relief Cream Mask
Dr. Althea 345 Relief Cream Mask
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Description
Soothe and restore irritated skin with the Dr. Althea 345 Relief Cream Mask — a calming cream‑type mask designed to deliver intensive relief and deep hydration. Formulated to comfort sensitive, stressed, or redness‑prone skin, this mask helps strengthen the moisture barrier while leaving the complexion soft, balanced, and visibly calmer.
Key Benefits
- Calms irritation and reduces visible redness
- Deeply hydrates and replenishes moisture
- Strengthens the skin barrier for long‑lasting comfort
- Cream‑type mask that absorbs smoothly without heaviness
- Helps soothe sensitive or stressed skin
- Ideal for both daily care and targeted relief
Perfect For
- Sensitive or redness‑prone skin
- Dry, irritated, or stressed skin
- Strengthening the moisture barrier
- A soothing nighttime treatment
- All skin types
How to use
How to use
After cleansing, prep your skin with toner, then spread the mask evenly over your face and leave it on for 10–15 minutes. Remove the mask and gently pat your skin to help it absorb the remaining essence.
Ingredients
Ingredients
Water, Melaleuca Alternifolia (Tea Tree) Leaf Water, Methylpropanediol, 1,2-Hexanediol, Butylene Glycol, Glycerin, Niacinamide, Octyldodeceth-16, Triethylhexanoin, Caprylic/Capric Triglyceride, Pentylene Glycol, Carbomer, Hydroxyethylcellulose, Tromethamine, Allantoin, Trehalose, Caprylyl Glycol, Ethylhexylglycerin, Dipotassium Glycyrrhizate, Disodium EDTA, Panthenol, Glycine Soja (Soybean) Seed Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Pantothenic Acid, Centella Asiatica Leaf Water, Cyclodextrin, Centella Asiatica Extract, Hydrogenated Lecithin, Madecassoside, Ceramide NP, Cholesterol, Camellia Sinensis Leaf Water, Resveratrol, Beta-Glucan, Sodium DNA, Nelumbo Nucifera Leaf Extract
Suitable for
Suitable for
Suitable for all skin types, including sensitive skin.
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